mask

  1. cageymaru

    Samsung Announces 5nm EUV Development Milestone

    Samsung has announced that its 5nm FinFet process technology is complete in its development and is ready for customer sampling. Compared to 7nm, Samsung’s 5nm FinFET process technology provides up to a 25% increase in logic area efficiency with 20% lower power consumption or 10% higher...
  2. DooKey

    Facebook Patent Application for Software That Detects Emotion and Gives You a Mask

    Facebook has applied for a patent for some unique software that detects the emotion displayed of an input photo or photos and then gives you a mask to reflect the emotion of the plurality of the photos. The patent says a user of the social network can select a mask that reflects how they're...
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